Chemical Etching Behaviour of a Polyimide O.P For organizational purposes

For organizational purposes

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Chemical Etching Behaviour of a Polyimide O.P For organizational purposesScientific Study from the year 2009 in the subject Physics Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton H (4 4' oxydiphenylene pyromellitimide). Kapton H samples were subjected to etching in 4N NaOH at 400 C and at 500 C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton H specimen was done using 75 MeV nucleon O+ ion